Deposition of aluminium nitride thin film

on kapton film using sputtering method

 

NurFahana Mohd Amin, Lee Zhi Yin, Fong Chee Yong, Ooi Poh Kok, Ng Sha Shiong 

 

Nano-Optoelectronics Research and Technology Laboratory, School of  Physics,

Universiti Sains Malaysia, 11800 Minden, Penang, Malaysia.

 

Corresponding author: annanur252@yahoo.com

 

Abstract

 

Many attempts have been made to deposited aluminium nitride (AlN) thin film by using sputtering method on flexible substrates. Deposition of AlN thin film on kapton film can potentially be used for development of flexible electronics and lab-on-chip systems. In this study, AlN thin films grown on the kapton film using radio-frequency sputtering method were explored. The AlN thin films were deposited by reactive RF sputtering of a pure aluminium target (99.999%), in an argon and nitrogen atmosphere. The structural and surface morphology properties of the deposited thin films were investigated by X-ray diffraction , field-emission scanning electron microscope and dispersive X-ray spectroscopy; while the optical properties of the deposited thin films were determined by using Fourier transform infrared spectrometer.

 

Keywords: Aluminium nitride; Sputtering; Thin film

 

 

 

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